Sic substrate no cvd kiʻi kiʻi kiʻi
Ke kūʻai aku nei i ka mea kūʻai
ʻO ke kāpiliʻana o ke kemika (cvd)ʻo Oxide kahi hana ulu e ulu ana kahi papa hana ma kahi o kahi kiʻiʻoniʻoni ʻO ke kaʻina ulu nui he haʻahaʻa haʻahaʻa a he nui ka nui o ka ulu ulu kiʻekiʻe i ka wā e hoʻohālikelikeʻia aiThermal mInede. ^. Hana ia i nā'āpana silicon nui loa no ka mea e nānāʻia ke kiʻi,ʻaʻole i ulu. Hoʻokumu kēia kaʻina hana i kahi kiʻiʻoniʻoni me kahi pale uila kiʻekiʻe,ʻo ia ka mea nui no ka hoʻohanaʻana i nā mea hoʻohana a me nā pono'ē aʻe.
ʻO ke kāpiliʻana o ke kalaʻana (CVD) i hanaʻia i ka wā e pono ai keʻano o kaʻaoʻao o waho akāʻaʻole hiki ke hoʻololiʻia.
Ke uluʻana i ka mea kūʻai aku
ʻO ka uluʻana o CVD i ka wā i hoʻokomoʻia ai kahi kīwī a iʻole keʻano o keʻano (ʻoi aku ka nui Ua neʻe ka mīkini ma waena o ka'ōnaehana a me nā mea e hāʻawiʻia ma waena o kaʻaoʻao o nā wana. Ke neʻe nei kēia mau papa mua ma o ka mea heluhelu, hoʻomaka nā wafers e hoʻonāukiuki iā lākou i loko o ko lākou wahi.
Ke pīhoihoi nui nei nā lula ma waena o ka'ōnaehana, hoʻomaka nā hana kolohe ma kaʻaoʻao o nāʻoki. Papa e hoʻomaka i kēia mau kolani e like me nā mokupuni, a me kaʻano hana o ka hanana a me Merge e hana i ke kiʻi i makemakeʻia. E hana i nā mea hana loiloi i nā bIPRESS ma luna o nā Wafers, kahi e hoʻokaʻawale i ka palena palena, e waiho wale ana i nā wana hana i waihoʻia me kā lākou hana kālā
Kiʻi 1
Nā pōmaikaʻi o ka hōʻaiʻe Vepor College:
- Ulu haʻahaʻa haʻahaʻa haʻahaʻa.
- ʻO ka uku wikiwiki (ma kahi o APCVD).
- ʻAʻole pono e lilo i silika siliicon.
- ʻO ka hana hana maikaʻi maikaʻi (ʻoi loaʻo Pecvd).
Kai 2
ʻO Silicon Dioxideing Cently vs
No kaʻike hou aku i ka waihona kālā o ke kalepa a iʻole e noi i kahi hua'ōlelo, eʻoluʻoluHoʻokaʻaʻike sVmI kēia lā e kamaʻilio me kahi lālā o kā mākou hui kūʻai kūʻai.
ʻAno o cvd
Lpcvd
ʻO ka hoʻohaʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa o ka waihoʻana i ka waihoʻana i ke kaʻina hana kūʻai kūʻai maʻamau maʻamau me ka hoʻopiliʻoleʻana. ʻO kaʻokoʻa nui ma waena o lpcvd a me nā hana cvd'ē aʻe ke kauʻana i ke kauʻana. Ua hoʻohanaʻo LPCVD i ke kiʻekiʻe kiʻekiʻe e waiho ai i nā kiʻiʻoniʻoni, maʻamau ma luna o 600 ° C.
Hoʻokumu kaʻenehana haʻahaʻa haʻahaʻa i kahi kiʻiʻoniʻoni nui loa me ka maʻemaʻe kiʻekiʻe, hana hou, a me ka home. Hanaʻia kēia ma waena o 10 - 1,000 pa
Pecvd
ʻO Plasma Hoʻonuiʻiaʻo Plasma e hoʻohui i ka waihona kālā he haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa, kiʻekiʻe kiʻi kiʻekiʻe kiʻekiʻe E hanaʻo Pecvd i kahi reactors cvd me ka hoʻohuiʻana o plasma,ʻo ia kahi'āpana o nā mea kūʻai uila (~ 50%). Heʻano haʻahaʻa haʻahaʻa haʻahaʻa e hana ai ma waena o 100 ° C - 400 ° C. Hiki ke hanaʻiaʻo Pecvd ma nā haʻahaʻa haʻahaʻa no ka meaʻo ka ikaika mai nā electrons e hōʻole i nā kiʻina e hana ai i kahi kiʻiʻoniʻoni e hana i kahi kiʻiʻoniʻoni ma kaʻaoʻao o ka lole.
Hoʻohana kēiaʻano waihona kālā iʻelua mauʻano likeʻole o nā plasma.
- Anuanu Hoʻohana kēiaʻano hana i ka ikehu o nā electrons e ka hoʻololiʻana i ke kaomi ma ke keʻena waihona.
- Homermal: nā mea uilaʻo ia keʻano like me nā'āpana a me nā:
I loko o ka lumi waiho waihoʻana, ua hoʻounaʻiaʻo radio-pinepine-pinepine-pinepine-pinepine ma waena o nā electrodes ma luna a ma lalo o ka wafer. Kuhi kēia i nā electrons a mālama iā lākou i kahi kūlana hoihoi e waiho ai i ke kiʻi i makemakeʻia.
ʻEhā mau hana e ulu ana i nā kiʻiʻoniʻoni ma o Pecvd:
- E kau i kahi wahi e hele ai i kahi electrode i loko o ke keʻena waihona.
- Hoʻolauna i nā haunaele a me ka waihoʻana i nā mea e pili ana i ke keʻena.
- Hoʻouna i nā plasma ma waena o nā electrodes a noi i nā voltage e hoʻowalewale i ka plasma.
- ʻO nā mea e hōʻoleʻia i nā pale a me nā hopena me ka papa holoi e hana ai i kahi kiʻiʻoniʻoni, nā mea e hoʻokaʻawale i waho o ke keʻena.
- Hoʻokomo i nā faila maʻamau: Silicon Sili-Silicon nitride, Amorpuro Silicon,Silichion oxynitrides (sixOyNz).
APCVD
ʻO ka loiloiʻo Atmospheric Pressal Vapor i kahi haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa e hana ana i loko o kahi huluhulu ma ke kaomiʻana i keʻano o ka nui o ka gellsoperac. E like me nā kaʻina o nā CVD'ē aʻe,ʻo APCVD e koi i kahi mea maikaʻi loa i loko o ke keʻena waihona a laila e kū mālie ana keʻano o keʻano o ka pahū. Ma muli o ke kiʻi maʻalahi o kēia ala, he uku kiʻekiʻe loa ia.
- ʻO nā films maʻamau i waihoʻia: Delped a iʻole nāʻili silinic siliicon, sillicon nitrides. Ua hoʻohana pūʻiaAnnalile.
HDP CVD
ʻO ka hōʻai'ēʻo Plansity High Guisma Chesma i kahi mana o Pecvd e hoʻohana ana i kahi mahana kiʻekiʻe, e hiki ai i ka mahana haʻahaʻa. Hoʻokumuʻia kēia i kahi kiʻiʻoniʻoni me ka nui o ka trench e hoʻopiha i nā pono.
- ʻO nā kiʻiʻoniʻoni maʻamau i waihoʻia: Silii Dioxide (Sio2),ʻo Silini Nitride (si3N4),silicon caride (sic).
Laki
ʻO SubAtmospHheric Press e hoʻokaʻawale i ka waihoʻana i nā mea e maki ai mai nāʻano'ē aʻe no ka mea e hana ia ma lalo o ke keʻena o ke kaʻa a hoʻohana i ka ozone (o3) E kōkua i ka catalyze i ka hopena. ʻO ke kaʻina hana e hana ai ma kahi kiʻekiʻe ma mua o ka lpcvd akā ma lalo o ka nui o ka mahana.
ʻO Shandong Zhongpeng kūikawā cembics CO., LTD kekahi o nā mea Silikia Silikia Silikia Crictide Cermide New Cremit New Cervic Soxt Stols In China. ʻO SICʻenehana SEMICICTIM:ʻO ka paʻakikī o Moh's Handness he 9 (ʻoi aku ka paʻakikī o Mohah ʻO ke ola lawelawe o SIC huahana he 4 i 5 mau manawa lōʻihi ma mua o 92% alumina. ʻO ka mor o Rbsic he 5 a 7 mau manawa i ka snbsc, hiki ke hoʻohanaʻia no nāʻano paʻakikī paʻakikī. ʻO ke kaʻina o keʻano he wikiwiki,ʻo ka laweʻiaʻana e like me ka mea i hoʻohikiʻia a me ka maikaʻi o ka maikaʻi a he lua ka maikaʻi. Hoʻomau mau mākou i ka hoʻokūkūʻana i kā mākou pahuhopu a hāʻawi i ko mākou mau naʻau i ke kaiāulu.